CHEMISTRY
Insulectro supplies all the chemistries required to manufacture circuit boards, as well as other products that support similar industries like chem milling.
About CHEMISTRY
Insulectro supplies chemistry from three world-class manufacturers, DuPont™, FOCUSTECH™, and Shikoku. With such a wide varitey of manufacutures, Insulectro can offer the best solutions for any process. We also have the abiltiy to make custom chemistries for any unique needs.
custom services
- Process Audits
- Process Control and Equipment
- FTIR Analysis
- Profilometry Analysis
- EDAX/SEM Analysis
Dry Film / Soldermask Developer
Inner Layer Dry Film Resist Strip
Affordable caustic blend dry film resist stripper. Proprietary cleaner and anti-tarnish to maintain clean equipment stain free copper.
Fast stripping dry film resist stripper. Proprietary cleaner and anti-tarnish to maintain clean equipment stain free copper.
Outer Layer Dry Film Resist Strip
High-loading dry film stripper. Proprietary cleaner and anti-tarnish to maintain clean equipment stain free copper.
Solvent-based stripper to maximize stripping capability. Proprietary cleaner and anti-tarnish to maintain clean equipment stain-free copper.
Tin Stripper
Ammonium Bifluoride / hydrogen peroxide tin stripper for stripping tin without attacking nickel.
High-loading tin stripper which can also achieve faster stripping speeds.
Antifoam
Micro Etch
Proprietary peroxide/sulfuric micro etch. Engineered to maximize soldermask and dryfilm adhesion.
Alternative Oxide
Non-etching oxide alternative. Engineered for High Speed Digital and RF applications.
OSP
DC Copper Plating
Low current density, high aspect ratio; Mid current density, high throughput.
Low current density, high aspect ratio; Mid current density, high throughput.
Electroless Copper
ENIG
VIA Fill
Reliable via filling technology; multiple variations based on geometries.
Pulse Plating
Cupric Etch
Proprietary rate enhancers afford substantially increased etch rates over generic sodium chlorate, hydrogen peroxide and chlorine gas.