RISTON® DI5100 (15, 25 micron)

Description

These are thin resists formulated for sub 25 micron resolution.

• Negative working, aqueous processable dry film photoresist

• Suitable for plating and etch application with acid etching.

• Vivid print out image after exposure for easy inspection

• Suitable on 355, 405nm and 375-405nm dual band LDI exposure machine.

Contact

Our expert team is here to assist with all questions and considerations.

Connect with us

Explore our latest webinars, glossary, conversion calculator and more.