A highly concentrated developer solution designed for use in photoresist and soldermask developing processes.
- Formulated using water softening agents, working solutions of DV-6450 can be made using tap water with up to 400 ppm’s of dissolved solids without forming significant hardness scale.
- Contains cleaning compounds that help break up resist residues to prevent deposition and build up in process and control equipment.
- The FOCUSTECH™ developing system combines high quality with ease of use to provide a superior developing system.
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